Pall Corp. Features New Filtration and Purification Technologies for the Semiconductor Industry at SEMICON West 2012
PORT WASHINGTON, N.Y.–(BUSINESS WIRE)–
Pall Corporation (NYSE: PLL)
will unveil the latest additions to its extensive portfolio of advanced
filtration and purification products designed to enable the
manufacturing of 22 nanometer (nm) and finer integrated circuits at SEMICON
West in San Francisco from July 10 -12 in booth #1519. The new Pall
technologies can help semiconductor device producers reduce product
defects and lower overall operating costs in chemical, gas,
photolithography, ultrapure water and chemical mechanical polishing
(CMP) applications.
Advanced 10 and 15 nm Filtration for Wet Chemical Processing
A key addition to Pall’s chemical filter line-up for SEMICON West is the
Read More Here: http://finance.yahoo.com/news/pall-corp-features-filtration-purification-130000774.html
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